This lab is dedicated to the development and growth of nanostructured films with significant engineering applications including hard coatings, solid lubricants, wear-resistant layers for environmental protection, new coatings for solar energy applications, biocompatible coatings for implant and other applications.
Hybrid Deposition System
The hybrid deposition system is a high vacuum platform used for thin film deposition. The thin film growth can be done using two main components of the system; the ion source and the nanoparticle source. The ion source is a plasma assisted process that produces and accelerates energetic ions generated from a source gas cracking (Ar, CH4 etc.) and finally they are accelerated on the substrate to be deposited. On the other hand, the nanoparticle source can produces controlled size of nanoparticles in the range of 1-20 nm, which can be generated from any metal as well as from many compound materials (oxides, nitrides, carbides etc.) and alloys. Finally, the two sources are mounted on two confocal ports for co-deposition process.
Thermal CVD
A thermal CVD system from Planartech and VG Scienta is designed to support both carbon nanotubes (CNT) and graphene growth. Additionally the system can be used for many other tasks such as heat treatment under various environments, annealing of nanostructured samples and transformation of preceramic polymers to ceramics.
It is a horizontal quartz (2´) hot-wall reactor system with LabVIEW/PC controls. The system supports deposition in manual and automatic mode with user defined recipes. The long 3 zone furnace with independent zone controls allows the processing of many samples simultaneously in different temperature conditions.
Technical specifications
Synthesis Lab
This lab is dedicated to the development and growth of nanostructured films with significant engineering applications including hard coatings, solid lubricants, wear-resistant layers for environmental protection, new coatings for solar energy applications, biocompatible coatings for implant and other applications.
Hybrid Deposition System
The hybrid deposition system is a high vacuum platform used for thin film deposition. The thin film growth can be done using two main components of the system; the ion source and the nanoparticle source. The ion source is a plasma assisted process that produces and accelerates energetic ions generated from a source gas cracking (Ar, CH4 etc.) and finally they are accelerated on the substrate to be deposited. On the other hand, the nanoparticle source can produces controlled size of nanoparticles in the range of 1-20 nm, which can be generated from any metal as well as from many compound materials (oxides, nitrides, carbides etc.) and alloys. Finally, the two sources are mounted on two confocal ports for co-deposition process.
Thermal CVD
A thermal CVD system from Planartech and VG Scienta is designed to support both carbon nanotubes (CNT) and graphene growth. Additionally the system can be used for many other tasks such as heat treatment under various environments, annealing of nanostructured samples and transformation of preceramic polymers to ceramics.
It is a horizontal quartz (2´) hot-wall reactor system with LabVIEW/PC controls. The system supports deposition in manual and automatic mode with user defined recipes. The long 3 zone furnace with independent zone controls allows the processing of many samples simultaneously in different temperature conditions.
Technical specifications
